method of monitoring a layer of feed material in a metallurgical furnace

专利摘要:
SYSTEM FOR MONITORING A LEVEL OF A FOOD MATERIAL LAYER IN A METALLURGICAL OVEN AND METHOD OF MONITORING A FOOD MATERIAL LAYER IN A METALLURGIC OVEN. The present invention relates to various systems and methods for monitoring the level of the feed material layer in a metallurgical furnace. At least one non-contact sensor is used to perceive the distance between the supply layer and the reference position. A process controller connected to the sensor provides a control signal based on the perceived distance. The control signal can be used to control several factors in the operation of the metallurgical furnace.
公开号:BR112012027312B1
申请号:R112012027312-4
申请日:2011-04-26
公开日:2020-11-17
发明作者:Afshin Sadri；Ehsan Shameli；Roberto Venditti；Andrei Kepes；Terry Gerritsen；Se An Southall；Bruce Uyeda
申请人:Hatch Ltd；
IPC主号:

专利说明:

Field
[001] The present invention relates to the measurement of the level of material contained in a metallurgical furnace and a relative furnace control system. Background
[002] Metallurgical furnaces are used to process the feed material to separate metals and other materials in the feed materials into metal waste and slag. Various factors, including the rate at which the feed material is introduced into an oven, the rate at which metallic residue and slag are removed from the oven, the operation of electrodes and control systems for melting equipment can be varied to control the process of converting feed material into metallic waste and slag. It may be desirable to monitor the amount of feed material in the metallurgical furnace to control some of these factors and other factors in the operation of a metallurgical furnace. summary
[003] In a first aspect, some embodiments of the invention provide a system to monitor the level of feed material layer contained in a metallurgical furnace including at least one non-contact sensor to sense the distance between the feed material layer and the reference position. The at least one sensor is positioned above the feed material layer. The system also includes a process controller communicably connected to at least one sensor to produce a control signal based on the detected distance.
[004] In some examples, the at least one sensor includes at least one transmitter positioned above the feed material. The sensor has an unobstructed line of sight for the layer of feed material contained in the oven. The at least one transmitter is configured to project an electromagnetic signal towards the feed material layer. The sensor also includes at least one receiver positioned to receive the reflection of the electromagnetic signal from the surface of the feed material layer. The sensor is operable to determine the detected distance.
[005] In some examples, at least one sensor is fixedly mounted in relation to the oven.
[006] In some examples, the oven comprises a plurality of supply ports and at least one sensor is positioned close to at least one among the plurality of supply ports.
[007] In some examples, the oven comprises a plurality of electrode ports and at least one sensor is positioned close to and at least one between the plurality of electrode ports.
[008] In some examples, the at least one sensor comprises a plurality of sensors each generating at least one corresponding detected distance and the process controller is configured to generate the control signal based on a plurality of detected distances.
[009] In some instances the process controller is configured to process the plurality of detected distances to provide the topography of the surface of the feed material layer.
[0010] In some examples, the system also includes a monitor communicably connected to the controller to show at least one between any of the various detected distances and the topography of the surface.
[0011] In some examples, the monitor is removed from the oven.
[0012] In some examples, the process controller is configured to compare the surface topography to a predetermined surface topography and provide a surface exit signal based on the comparison.
[0013] In some examples the process controller is configured to show a plurality of control signals, each control signal being based on a signal corresponding to the plurality of detected distances.
[0014] In some examples, each sensor comprises a radar sensor.
[0015] In some instances the system also includes a protective housing surrounding each sensor.
[0016] In some examples, each protective housing comprises a Faraday cage to provide electromagnetic shielding.
[0017] In some examples, the system also includes a thermal radiation shield between each sensor and the feed material layer, to inhibit heat transfer between the sensor and the feed material layer.
[0018] In some examples, the thermal radiation shield is substantially transparent to the electromagnetic signal and reflection.
[0019] In some examples, each sensor is positioned above the corresponding opening in the oven ceiling, the opening providing the clear line of sight for the feed material layer.
[0020] In some examples, the reference position is the known sensor mounting location.
[0021] In some examples, the controller is operable to generate the control signal in real time.
[0022] In some instances, the controller process is communicably connected to a feed actuator and is configured to generate a feed control signal to automatically regulate the feed rate of the feed material based on the control signal feed.
[0023] In some examples, the controller process is communicably connected to an actuator electrode and is configured to generate an electrode control signal to automatically move an electrode from a first position to a second position based on the control signal from the electrode.
[0024] In some examples, the controller process is communicably connected to an electrode power supply regulator and is configured to generate an electrode control signal to automatically regulate the energy supplied to an electrode based on the control signal electrode.
[0025] In some examples, the at least one sensor is supported in a mobile way to allow the at least one sensor to measure a first detected distance when the sensor is in a first position and to measure a second detected distance when the sensor is in a second position.
[0026] In some examples, the at least one sensor is operable to measure a plurality of detected distances corresponding to a plurality of locations on the surface of the feed material layer.
[0027] In some examples, the process controller is configured to receive and process data from at least one thermal sensor.
[0028] In some examples, at least one sensor is positioned to perceive a second distance between the second layer of material and the reference position.
[0029] In some examples, the at least one sensor includes a first sensor positioned to measure the detected distance and a second sensor positioned to measure a second detected distance between a second layer of material and the reference position.
[0030] In some examples, the at least one receiver comprises at least two receivers and the at least one transmitter is connected in a communicable manner to each of the at least two receivers.
[0031] According to a second aspect, some embodiments of the invention provide a method of monitoring a layer of feed material in a metallurgical furnace including the steps of: a) providing at least one non-contact sensor positioned above the layer of feed material contained in the oven while the oven is in use; b) measure the detected distance between the surface of the feed material layer and the reference position using the sensor; c) provide a process controller connected in a communicable way to the sensor to generate a control signal based on the detected distance; and d) produce the control signal.
[0032] In some examples, step a) comprises providing at least one transmitter in a fixed position above the layer of feed material and providing at least one receiver above the layer of feed material, and step b) comprises designing a electromagnetic signal from the transmitter towards the surface of the feed material layer, collecting the reflection of the electromagnetic signal from the surface of the feed material layer and comparing the electromagnetic signal to the reflection.
[0033] In some examples, the method also includes the step of using the process controller to control at least one between the feed material supply rate, the electrode position and the electrode power supply based on the control.
[0034] In some examples, the step of controlling at least one between the supply material supply rate, the electrode position and the electrode power supply based on the control signal is performed automatically by the process controller, without user intervention.
[0035] In some examples, at least the steps of comparing the electromagnetic signal to reflection and producing the control signal are performed by the controller in real time.
[0036] In some examples, the method also includes the step of providing a monitor and generating an information output based on the control signal.
[0037] In some examples, step a) comprises providing a plurality of transmitters above the layer of feed material, step b) comprises providing a corresponding plurality of receivers above the layer of feed material, and determine the corresponding detected distance for each transmitter.
[0038] In some examples, step c) comprises providing a plurality of control signals, each control signal based on the detected distance.
[0039] In some examples, step c) comprises generating a surface topography based on the plurality of detected distances and generating a surface control signal based on the surface topography.
[0040] In some examples, the surface is an upper surface of the layer of feed material contained in the oven.
[0041] In some examples, the method also includes the step of placing the at least one sensor in a second position in a second position to measure a second detected distance between the second location on the surface and the reference position.
[0042] In some examples, the method also includes the step of placing the at least one sensor in a second position to measure a second detected distance between the second layer of material and the reference position.
[0043] According to a third aspect, some embodiments of the present invention provide a feed control system for a metallurgical furnace containing a layer of feed material, the feed control system includes at least one non-contact sensor to measure the distance between the surface layer of the feed material and the reference position. The sensor is positioned above the feed material layer. The system also includes a process controller connected in a communicable manner to at least one sensor and configured to produce a control signal based on distance. The system also includes at least one power supply actuator connected communicably to the controller to automatically regulate the flow of feed material in the oven based on the control signal.
[0044] In some examples, the at least one sensor includes at least one transmitter positioned fixedly above the layer of feed material and having an unobstructed line of sight for the layer of feed material. The at least one transmitter is configured to project an electromagnetic signal towards the feed material layer. The sensor also includes at least one receiver positioned fixedly to receive the reflection of the electromagnetic signal from the surface of the power layer.
[0045] According to a fourth aspect, some embodiments of the present invention provide a metallurgical furnace including a reactor container to contain the layer of feed material and at least one non-contact sensor mounted on the reactor container. The sensor is positioned to have an unobstructed line of sight for the layer of feed material contained in the oven. The sensor is operable to measure the detected distance between the feed material surface and the sensor.
[0046] In some examples, the oven also includes a process controller connected in a communicable way to at least one sensor. The process controller is operable to generate and produce a control signal based on the detected distance.
[0047] In some examples, the oven also includes at least one feed port with at least one feed supply actuator to regulate the flow of feed material through at least one feed port. The at least one power supply actuator is communicably connected to the process controller to automatically regulate the flow of feed material in the oven based on the control signal.
[0048] In some examples, the furnace also includes at least one electrode received in a mobile manner inside the electrode port corresponding to at least one electrode actuator operable to change the electrode position relative to the reactor vessel. Each electrode actuator is communicably connected to the process controller to change the position of at least one electrode based on the control signal.
[0049] According to a fifth aspect, some embodiments of the present invention provide a system for monitoring the level of a layer of material contained in a metallurgical furnace including at least one non-contact sensor to measure the distance between the layer of material and the reference position. The at least one sensor is positioned above the material layer. The system also includes a process controller connected in a communicable manner to at least one sensor to produce a control signal based on the detected distance.
[0050] According to a sixth aspect, some embodiments of the present invention provide a method for controlling the rate of feed at which the feed material is supplied to the metallurgical furnace. The method includes the steps of: a) obtaining the load bank level; b) obtain the level of slag; c) compare the level of the load bank with the level of slag to determine the height of the load bank; d) comparing the height of the load bank with a plurality of predetermined acceptable height values; and e) adjust at least one between the feed rate and the electrode energy based on the comparison of step d). Brief description of the drawings
[0051] A preferred embodiment of the present invention will now be described in detail with reference to the drawings, in which:
[0052] figure 1 is a schematic representation of an example of a metallurgical furnace;
[0053] figure 2 is a schematic representation of another example of a metallurgical furnace;
[0054] figure 3 is a schematic representation of another example of a metallurgical furnace;
[0055] figure 4 is an isometric view of an example of a metallurgical furnace;
[0056] figure 5 is a partial section view of a portion of the ceiling of a metallurgical furnace with a sensor mounted on the ceiling;
[0057] figure 6 is a schematic representation of an example of a metallurgical furnace;
[0058] figure 7 is a schematic representation of an example of a metallurgical furnace;
[0059] figure 8 is a schematic representation of an example of a metallurgical furnace;
[0060] figure 9 is a diagram of a control system for metallurgical furnace;
[0061] figure 10 is a schematic representation of an example of a metallurgical furnace and a control system for the furnace;
[0062] figure 11 is a flow chart illustrating an example of a method of operating a control system for a metallurgical furnace;
[0063] figure 12 is a flow chart illustrating another example of a method of operating a control system for a metallurgical furnace;
[0064] figure 13 is a flow chart illustrating another example of a method of operating a control system for a metallurgical furnace; and
[0065] figure 14 is a flow chart illustrating another example of a method of operating a control system for a metallurgical furnace;
[0066] For simplicity and clarity of the illustration, the elements shown in the figures were not drawn to scale. For example, the dimensions of some of the elements may be exaggerated in relation to other elements for the sake of clarity. In addition, where deemed appropriate, reference numerals may be repeated between figures to indicate corresponding or similar elements. Description of the exemplary modalities
[0067] Various equipment or processes will be described below to provide examples of modalities for each claimed invention. The described modalities do not limit any claimed invention. The inventions described are not limited to equipment or processes having all the characteristics of any of the equipment or processes described below or characteristics common to many or all of the equipment described below. It is possible that an equipment or process described below is not a modality of any claimed invention. Any invention described in an equipment or process described below that is not claimed in this document may be the subject of another protective instrument, for example, a continuing patent application.
[0068] Initially reference is made to figure 1, which is a schematic representation of a metallurgical furnace, for example, furnace 100, having a bottom surface, at least one side surface and a top surface that cooperates to define an oven or reactor container 108 to contain the material being melted in the oven. Oven 100 includes a sensor 110 which is used to determine the position or level of material in the oven, relative to sensor 110. Based on the level of material in the oven, one or more operating parameters of the oven can be modified, including, for example, example, the rate at which the additional material is introduced into the reactor vessel and the rate at which the material is removed from the reactor vessel. Optionally, the sensor 110 can be connected in a communicable way to any suitable instruments, actuators and controllers so that the operational parameters can be automatically adjusted based on the material level, without requiring intervention or procedures from a human operator.
[0069] In the examples described here, sensors 110 are permanently or fixedly connected to oven 100 in their operating positions so that sensors 110 can conduct progressive measurements while the oven is in use, as opposed to being positioned only temporarily on the oven for a measurement time. Consequently, sensors 110 are configured to withstand the operating conditions expected from the furnace. Although any given sensor can be moved or positioned in relation to oven 100 (that is, turned, rotated, moved), sensors 110 are fixedly connected to the oven so that the sensors remain in their operating position while the oven is in use . It is understood that even when permanently mounted, the sensors can be temporarily removed or separated for inspection, maintenance or replacement.
[0070] In figure 1, the bottom surface of the reactor 100 is provided by the sill 102, the side surface is provided by the side walls 104 and the top surface is provided by the ceiling of the reactor 106. Together, these elements define the reactor vessel 108. The roof of the reactor 106 includes at least one feed port 112 through which the material to be melted, or the feed material, can be introduced into the reactor container 108. The flow or supply of feed material in the reactor container 108 is shown schematically in the figures by the plurality of arrows 114. The feed material can be any material suitable for melting in furnace 100, including, for example, ore, metal, etc.
[0071] When oven 100 is in use, the feed material melts to form a generally melted fluid or paste that can include a variety of different components. It is understood that the relative difference in the density of such components can result in predictable stratification or formation of layers of material in the reactor container 108. In the illustrated example, the material in the reactor container 108 contains a layer of molten material, which is the final product. the merger operation. Depending on the nature of the feed material supplied to the furnace 100, the molten material is commonly referred to as a metallic phase, or a phase of metallic waste. It is understood that the sensors and control systems described can be used in forums that contain either a molten metal phase or a molten metal waste phase. For simplicity, the examples described here refer to a molten metal waste phase that forms a metal waste layer 116, but it is understood that alternatively a molten metal phase can be present in any of the examples described here. The metal layer 116 defines the depth or thickness of a measurable metal waste layer 117.
[0072] Floating above the metal waste layer 116 is a layer of slag 118. The layer of slag 118 is formed from the material defining a slag phase, which may include a combination of impurities, lighter molten elements (possibly comprising different metallic compositions) and other by-products produced when the feed material is melted. In some examples, the slag layer 118 generally contains undesirable compounds and is removed from the reaction reactor 108 separately from the metal waste phase. The slag layer 118 defines the depth of the slag layer 119.
[0073] Over time, in some embodiments, the metal waste phase portions in the metal waste layer 118 can solidify or freeze, and form solid particles of metal waste that are more dense than the metal waste phase and therefore , tend to deposit at the bottom of the container 108. Such solid particles of metallic waste can collect at the bottom of the container 108 and can form a build layer 122, having a layer depth 123.
[0074] While the interfaces between each of these levels is schematically illustrated as a straight line for convenience and clarity, it is understood that such interfaces cannot be defined by a single plane, but, on the contrary, can vary across the surface of the container 108 and can define interface sublayers that include a mixture of the adjacent phases (for example, a mixture of slag and metal waste phases between the slag layer 118 and the metal waste layer 116). These interface sublayers typically have a measurable thickness.
[0075] When oven 100 is in use, the incoming feed material 114 can be added to a reaction vessel 108 which already contains the combination of molten metal waste material and slag material. Since the feed material is exposed to the operating temperature of the oven, for example, in some ovens where the temperature can be between 1500-1700 ° C, the feed material can be consumed to produce additional metal waste and slag material. If the rate at which the feed material is introduced into the reactor vessel 108 exceeds the rate at which the feed material contained in the reaction vessel 108 is consumed (i.e., transformed into waste metal and slag material), the layer of material schematically illustrated as a feed material layer 120, it can accumulate in an unfused condition above the slag layer 118. The accumulated feed material layer is also described as a load bank 120, and the distance between the feed interface feed-slag phase or the feed / slag interface 124 and the upper or exposed surface of the feed material layer 125 defined the depth of the feed material layer or the height of the load bench 121. The distance between the feed / slag interface 124 and oven roof 106 (or described below) another reference position that is used to determine that bank level 128, described below) defines the slag level 125.
[0076] The distance between the upper surface 126 of the load bank 120 and a predetermined reference point in the reactor 100, for example, a point on the ceiling 106, defines the level of the load bank 128, also referred to here as edge height. free.
[0077] To determine the total depth level 130 of the material contained in the reactor container 108 and / or the level of the load bank 128, the sensor 110 can be positioned above the material in the furnace 100 to measure or perceive the distance between the surface top 126 of load bank 120 and sensor 110, shown in figure 1 as detected distance 132.
[0078] In some examples, the load bank level 128 can be calculated based on the detected distance 132. For example, sensor 110 can be mounted on ceiling 106 in a known location so that the position of sensor 110 in relation to reactor vessel walls 108 is known. In this example, the level of the load bank 128 can be calculated by comparing or combining the detected distance 132 with the known position of sensor 110 in relation to container 108. Optionally, sensors 110 can be positioned so that the detected distance 132 matches the level of the load bank 128, so that no further calculations are needed to determine the level of the load bank 128.
[0079] Sensor 110 is communicably connected to a controller, for example, a process controller 138. The connection between sensor 110 and process controller 138 can be a one-way connection (allowing data to be sent from sensor 110 to the process controller 138) or a bilateral connection (allowing data to be sent from sensor 110 to process controller 138 and from process controller 138 to sensor 110). Optionally, process controller 138 can be configured to control the operation of sensor 110 and receive information, including detected distance 132, from sensor 110. Process controller 138 can then generate one or more output signals or control signals that they can be used to provide information to the user so that an operator can take appropriate action (ie, as an open loop control system) or automatically control one or more other aspects or operating parameters of the reactor, as explained in detail below (ie as a closed loop control system). Process controller 138 can be connected to sensor 110 using any suitable cable or connector that can withstand the operating conditions expected from oven 100.
[0080] With reference to figure 2, an example of an oven 100, an electric arc oven, includes a reactor container 108 containing a layer of metallic waste 116, the slag layer 118, and the load bank 120. The roof 106 of oven 100 includes a pair of feed ports 112 for receiving the supply of feed material 114 and an electrode port 140 for receiving the corresponding electrode 142. Electrode 142 can be any suitable electrode known in the art, and can be received movably within the electrode port 140 so that the vertical position of electrode 142 can be adjusted, for example, based on the amount of material in the reactor container 108, using any suitable electrode actuator represented schematically as an actuator module electrode 144.
[0081] Each feed port 12 can be supplied with feed material using any feed material conduit, for example conduit 146, known in the art. In the illustrated example, the supply material conduit 146 includes a supply supply regulator to control or regulate the flow of supply material in the reactor container 108. As shown schematically in figure 2, an example of a supply regulator includes a port feed 150 which is moved by a gate actuator 152 which is used to physically constrain, and optionally completely block, the feed conduit 146.
[0082] As the feed material is added through the feed ports 112, it can tend to accumulate under the feed ports 112 and then disperse to other portions of the reactor container 108 as additional feed material is added. In figure 2, the upper surface 126 of the load bank 120 is illustrated as having an inclined shape, or generally a cone or pyramid shape, having a thickness or height of the load bank 121 below the feed port 112 which is greater that the height of the load bank 121 in other locations, for example, near electrode 142 as illustrated.
[0083] In the illustrated example, the load bank 120 is shown to have a desired load bank height 121. In that state the upper surface 126 is shown to be in a desired position with respect to the top of the slag layer 118, the feed / slag interface 124. Illustrated using dashed lines on the right side of figure 2, the upper surface 126 'represents an overflow condition (in which the load bank was built up to an undesirable height 12T as a result of the feed material being fed to oven 100 faster than it can be consumed). As the feed material continues to accumulate the surface 126 'may rise above the desired operating position within the reactor container 108, resulting in a detected distance 13e2' which is less than the level of the desired load bank 128. In some ovens, a load bank having an increased load bank height 121 acts as a thermal insulator that reduces heat transfer between the slag and the phases of metallic residues in the free edge region (the region between the surface of the load bank 126 and the oven roof). This decrease in heat transfer can result in overheating of the material in the furnace, which can lead to the formation of crust on the surface of the load bank 126 and can reduce the melting efficiency. As explained in more detail below, process controller 138 can be connected to both sensors 110 and port actuator 152, so that when sensors 110 detect an overfeed condition, that is, when the height of the load bank 121 has increased beyond a predetermined limit, the flow of feed material into the oven can be automatically restricted without requiring operator action.
[0084] Also in figure 2, the upper surface 126 "represents a condition of underfeeding (in which the height of the load bench 121 has decreased to an undesirable height as a result of the feed material being fed to oven 100 more slowly than it does. can be consumed.) A thinner than desired load bank height 121, as occurs when the reactor is underfed, can result in areas of heat on the roof of furnace 106 and reduce melting efficiency as a result of a loss of greater than expected heat (due to the absence of the insulating effect of the load bank 120). In this example the detected distance between the sensor 110 and the upper surface 126 "would exceed the desired or expected distance 132.
[0085] In addition to variations in the feed rate, the position of surface 126 in relation to sensor 110, that is, the detected distance 132, may vary based on other oven operations. For example, the distance between surface 126 and sensor 110 may increase (i.e., the level of the load bank 128 may increase) when the furnace is being poured because the total amount of material in the furnace is reduced. In other cases, the level of the load bank 128 may decrease (i.e., the surface 126 may move towards the sensor 110) if the oven is overfed. If surface 126 reaches a predetermined location within the furnace, for example, 1 m from the furnace ceiling, the detected distance 132 may decrease below a predetermined alarm condition level and process controller 138 can generate an alarm condition and / or a control signal based on the alarm condition. Optionally, process controller 138 can be configured to automatically turn the oven off.
[0086] In another example, when the actual detected distance 132 differs from an expected or desired distance 128, or if the height of the load bench 121 differs from the desired height range, process controller 138 can be operated to control the actuator of port 152 to automatically adjust the feed material supply rate accordingly, for example, increasing the supply rate when reactor 100 is underfed, and decreasing the supply rate when reactor 100 is overfed or is approaching or passing an alarm level.
[0087] In relation to figures 2, 6, 7 and 8, an example of a sensor 110 that is suitable for use in combination with oven 100, is a radar sensor 110 that emits and receives electromagnetic signals. Radar sensors, and the operating principles of existing radar sensors are known in the art and will be explained only briefly below.
[0088] When configured as a radar sensor 110, each sensor 110 includes at least one transmitting portion to generate and project an electromagnetic signal (for example, a microwave pulse or a continuous microwave signal) and at least one corresponding receiving portion to receive incoming electromagnetic signals.
[0089] Electromagnetic output signals (or EM signals) generated by sensors 110 are projected towards the material in the reactor 100, for example, towards the upper surface 126. The signals travel at a known rate and have other known properties (not including frequency and magnitude of the signal). In the present examples, electromagnetic output signals are illustrated using a plurality of arrows 154. When the EM output signals 154 contact an object on the opposite side, such as the upper surface 126, at least a part of the output signals 154 is reflected from surface 126 and forms an input or reflected signal, illustrated here using a plurality of wavy arrows 156. The magnitude of the emission force of EM 154 signals can be selected based on a variety of factors, including, for example, factory operating conditions and applicable safety regulations.
[0090] With reference to figure 2, each sensor 110 can project an output EM signal 154 towards a portion of the load bank 120 that supports sensors 110. The information received from each sensor 110 is sent to a suitable controller in the furnace control system, eg process controller 138, where it can be compared to predetermined furnace operating parameters, including, for example, acceptable load bank heights, load bank alarm level conditions, desired or optimal detected distances, acceptable range of detected distances, and one or more alarm criteria that are stored in memory or in the system database. Based on the results of the comparison (or research) the process controller 138 can generate one or more suitable outputs or control signals.
[0091] Optionally, sensor 110 can be configured to emit EM signals in a generally tapered pattern, represented by dashed lines 158, which increase in diameter as they approach the 120 load bank. Projecting EM signals in this way can allow each sensor 110 determines the position of the upper surface 126 over a larger area (i.e., through a larger proportion of the total surface area of the material held in the container 108). Perceiving the distance across a larger area can allow sensor 110 to measure multiple distances 132 for the portion of surface 126 within the conical projection 158. After collecting each distance 132, process controller 138 can optionally be configured to average all the detected distances 132 separately and / or determining a plurality of values of the detected distances 132 separately (for example, a maximum and minimum distance 132 detected within a given measurement area).
[0092] Comparing the distances 132 with the position of the feed / slag interface 124, the process controller 138 can determine a plurality of load bank heights 121, including a maximum height, a minimum height, and an average height. Process controller 138 can generate a control signal based on the minimum, maximum and average distances 132, the minimum, maximum and average height of the load bank 121 or any of its combinations or sub-combinations.
[0093] In relation to figure 6, in some examples of oven 100, a sensor 110 can be mounted mobile to oven 100, for example, on the ceiling of oven 106, using any suitable mobile mounting equipment, including, for example , a joint. Using a joint, sensor 110 can be rotated and / or rotated in relation to oven 100, allowing each sensor 110 to have multiple measurements in multiple locations. In some instances the joint can be controlled by any suitable controller, for example, process controller 138, and can be programmed to drive sensor 110 in a predetermined pattern (or possibly random or pseudo random) to measure and record a plurality of measured distances 132 at different locations on the upper surface 126 of the load bench 126. As described above, the plurality of measured distances 132 recorded using the mobile sensor 110 can be processed to obtain a variety of different information regarding the contours or the topography of the upper surface 126 (for example, average height of the load bench 121, maximum or minimum height of the load bench, etc.).
[0094] In some cases, the rate of consumption of feed material in the oven 100 increases in the portions of the load bank 120 that surround the electrode (s) 142 in the oven 100. In such a case, the height of the charge 121 near electrodes 142 may be less than the height of charge bank 121 at other locations in oven 100.
[0095] In some examples, as illustrated in figure 6, the feed material surrounding the electrode 142 can be completely consumed, creating a feed bank height of zero, while other locations in the container 108 may still have a material accumulation feed providing a measurement of the load bank 120. Where the feed material has been completely consumed, the upper surface 176 of the slag layer 118 can be exposed to the free edge area and can be within the location of the sensor 110.
[0096] In these examples, sensor 110 can be used to determine the height of the load bank by measuring the position of the upper surface 126 of the load bank 120, and to determine the level of the slag layer 118 by measuring the distance between the exposed surface 176 of the slag layer 118 and the sensor 110 (or other reference position). Measurements of both the top surface 126 and the slag surface 176 can be sent to process controller 138 for further processing as described here.
[0097] In relation to figure 3, an oven 100 is illustrated showing examples of possible mounting locations for sensors 110. As shown on the left side of figure 3, a sensor 110 can be mounted above the oven, for example, above the ceiling 106, and does not need to be directly attached to any portion of oven 100. In this example, sensor 110 can be mounted on an external support structure 162 that extends from, and / or is coupled to, an external support structure that is located adjacent to furnace 100, for example, a building roof or other furnace area, or a free structure support structure.
[0098] Sensor 110 can be positioned at any desired location above ceiling 106, and at any height above ceiling 106, provided that sensor 110 is aligned with a corresponding hole or opening 164 in ceiling 106 or another position of the oven ( in that case the opening is shown to be formed in a portion of the supply supply conduit 146, optionally in a portion of the conduit 146 that hosts the feed port 150). Aligning sensor 110 with an opening 164 in oven 100 ensures that sensor 110 has an unobstructed line of sight for the material contained in oven 100, for example, the load bench 120. Providing an unobstructed line of sight means that the The path between the sensor 110 and the material in the furnace 100 (i.e., the load bank 120) is substantially free of obstacles or objects that could materially interfere with the desired operation of the sensor 110.
[0099] The sensor 110 mounted above the oven 100 can be mounted in a mobile manner, for example, using a joint as described here, to record the distance measurements at multiple locations on the upper surface 126. Alternatively, or in addition, sensor 110 can be movable between a plurality of positions corresponding to a plurality of openings 164 in oven 100, allowing sensor 110 to take distance measurements through each of the plurality of openings 164. Sensors 110 mounted above oven 100 will measure the detected distance 132 which is greater than the level of the load bank 128. To determine the level of the load bank 128, the measured distance 132 can be compared with the known mode of oven 100, including the relative distance between sensor 110 and the ceiling 108 or another reference position.
[00100] In relation to the right side of figure 3, a sensor 110 positioned inside the internal or inner volume of the reactor container 108 and is supported using an internal support 166. The sensor 110 can be mounted in a mobile way for the internal support 166 using an articulation as described here or any other suitable equipment that allows the rotation and / or rotation of the sensor in relation to the internal support 166. Alternatively, or in addition, the internal support 166 can be mobilely mounted to the container 108, for example, in a system of rails or grooves (not shown) so that the internal support 166 can move vertically, as indicated by arrows 168, and horizontally (that is, in Page as seen in figure 3). Internal support 166 can also be configured to stretch and contract, for example, by telescopicity, as illustrated by arrows 170.
[00101] In the examples where the physical location of sensor 110 and internal support 166 can change (as opposed to simply rotating or rotating in the same place) or sensor 110, the process controller or other suitable module can be configured to respond by the physical location of sensor 110 in relation to container 108 when determining the detected distance 132. For example, comparing the vertical position of the inner support 166 with the known reference position to determine the position of the baseline and then comparing the detected distance 132 with the position of the baseline to determine the level of the load bank 128 in relation to the reference position.
[00102] Alternatively, or in addition, distances detected from a plurality of sensors 110 (either fixed or mobile sensors) can be compiled or composed by any computer or controller, for example, process controller 138, to provide information with respect to the total topography of substantially the entire upper surface 126 (or at least the portions of the upper surface 126 that can be measured by one or more sensors 110). Figure 4 illustrates an example of an oven 100 having a plurality of sensors 110 mounted on the ceiling of oven 106. In this example, a sensor 110 is provided next to each feed port 112, to monitor the height of the load bench below each power port 112, and a second plurality of sensors 110 positioned next to each electrode port 140, to monitor the height of the charge bank around each electrode extending in oven 100.
[00103] Each of the sensors 110 in this example can be connected to a single process controller 138 that can receive and process the signals from each sensor 110. Alternatively, or in addition, one or more subcontrollers 160 (illustrated using dashed lines ) can be provided to collect data from a portion of sensors 110, for example, from the plurality of sensors near feed ports 112, and then relay the collected information, or an output signal based on the information collected for the primary process controller 138. Although illustrated to include four supply ports, 112 and four electrode ports 140, it is understood that oven 100 of figure 4 can have any desired number of supply ports 112 and electrode ports 140 (if necessary), It is also understood that additional sensors 110 can be placed in additional locations through oven 100 if desired, or a greater or lesser number of sensors 110 can be used (so that there is no 1: 1 ratio of ports 112,140 to sensor 110.
[00104] With reference to figure 7, in some examples, each sensor 110 can include separate transmitting and receiving components. The transmitting components can be any suitable transmitter or antenna, including horn antenna, satellite dish, rod antenna, and other types of antennas.
[00105] As exemplified, sensor 110 includes a transmitter 172 and a pair of separate receivers 174. In this embodiment, the output EM signal 154 of transmitter 172 can produce a plurality of reflected EM signals 156 and each receiver 174 can receive a signal different reflected 156, which allows each receiver 174 to perceive different distance 132. Optionally, transmitter 172 can be mobile and can emit a series of pluses or output signals 154 to produce a desired number of reflected signals 156.
[00106] Transmitter 172 and receivers 174 are connected in a communicable way with each other and with process controller 138.
[00107] In any of the examples described here, transmitters (and optionally receivers), for example, transmitter 172 or the transmitter portion of integrated sensors 110, may include an antenna array and any other suitable components, including waves, filters and signal processors.
[00108] In some examples, sensor 110 can be configured to measure the distance to multiple surfaces or layers defined in the material in oven 100. As shown in figure 8, sensor 110 can be configured to emit an EM output signal 154 that it is specifically calibrated or modulated to produce predictable partial reflections 156a-c as the EM signal passes through multiple layers of material. In the illustrated example, a first reflection 156a is created when the EM 154 signal contacts the upper surface 126 of the load bank 120. This reflection 156a can be used by the sensor 110 and / or the process controller to determine the height of the load bank .
[00109] A second partial reflection 156b is created when the EM 154 signal contacts the upper surface 176 of the slag layer 118, defined at the interface between the load bank 120 and the slag layer 118. The second partial reflection 156b can be used to calculate the level of the interface 176 (in relation to the sensor 110 or a reference point) and calculate the bank thickness of the slag layer 120.
[00110] A third partial reflection 156c is created when the EM 154 signal contacts interface 178 between the slag layer 118 and the matte layer 116. The third partial reflection 156b can be used to calculate the level of interface 178 (in relation to 110 or a reference point) and calculate the thickness of the slag layer 118.
[00111] Sensor 110 can include multiple receivers to collect partial reflections 156a-c, or a single receiver that is configured to collect and decipher each reflection 156a-c. Partial reflections 156a-c can be isolated based on a number of factors including frequency and attenuation using known methods.
[00112] In any of the examples described here, the information compiled from any plurality of sensors 110, optionally in combination with inputs from other furnace instruments, can be used to create a map or profile of the surface topography (i.e., a representation graphical shape of the upper surface 126) which can then be compared to one or more preferred or desired surface topographies stored in a database, memory or other suitable system components.
[00113] Optionally, as exemplified in figures 1, 2 and 5, sensor 110 can be encased in a housing 134 which can optionally protect sensor 110 from dust, rust, ash and other particulate contamination as well as providing a desired degree of thermal and electromagnetic shielding. Housing 134 can be supplied with additional utilities and monitoring equipment to protect and monitor sensor 110. For example, the interior of housing 134 can be flushed with a cooling gas, for example, air, through nozzles 184 which are connected with hose 186 to a gas supply system (not shown). Pumping filtered cooling gas into frame 134 can help cool sensor 110 and can reduce the accumulation of dust and other debris within frame 134. Optionally frame 134 can be configured to withstand the expected pressure loads that can be exerted on the frame , 134 during normal operation of oven 100 (for example, when reactor vessel 108 is operated under mild vacuum conditions, or when gases of relatively high pressure are emitted from the material in the oven).
[00114] Frame 134 can also be equipped with any suitable temperature sensor 188 (for example, a thermocouple or RTD) to allow remote monitoring of the internal temperature of frame 134. Optionally, the information from temperature sensor 188 can be provided to process controller 138.
[00115] In some furnaces 100, for example, we went on electric arc, the sensor 110 mounted in the reactor container 108 may be exposed to high levels of electromagnetic energy or signals that can interfere with the operation of the sensor and its associated electronic components. In such examples, as exemplified in Figure 5, frame 134 may include electromagnetic shielding components including, for example, a Faraday shield or a Faraday cage 180, to attenuate the magnitude of the electromagnetic signals reaching sensor 110. Optionally, such electromagnetic shields can be configured to filter or classify electromagnetic signals in a first spectrum or in a selected spectrum, while allowing electromagnetic signals in a second spectrum to pass relatively uninhibited to frame 134.
[00116] Alternatively, or in addition, housing 134 may include one or more thermal radiation shielding elements to protect the sensor 110 from the thermal radiation emitted by the material contained in the reactor vessel 108. Optionally, the thermal radiation shielding elements may be positioned between the sensor 110 and the upper surface 126 of the load bench 120. In such examples, the thermal radiation shield can be formed from a material that provides a desired level of thermal insulation while still allowing the desired operation of the sensor (that is, the thermal radiation shield is substantially transparent to sensor 110 so that it does not interfere with the operation of sensor 110). The radiation shield can be any suitable material, including refractory fabric. In the illustrated examples, the thermal radiation shield is provided as a removable cassette tape containing a refractory fabric 136.
[00117] Providing the refractory fabric 136 as a removable cassette allows the refractory fabric 136 to be removed for inspection, repair and maintenance, and then reinserted to provide the desired shielding. The use of removable cassette tapes may also allow the user to exchange or replace the refractory shield 136 with a different material to accommodate different sensors 110 and different operating conditions of the oven. In other examples, the radiation shield can be integrally formed with the sensor 110, or supplied as a fixed component connected to the housing 134, the reactor vessel 108, or any other suitable support.
[00118] Housing 134 may be removed to allow inspection and maintenance of sensor 110, and may include a cable 182 to permit removal of housing 134.
[00119] It is understood that the furnace can be any type of suitable metallurgical furnace (including electric furnaces and non-electric furnaces) and the method of adding feed material to the furnace can be any suitable method, including, for example, a continuous, semi-continuous or batch feeding.
[00120] Although described as a radar sensor in the examples above, the sensor can be any suitable type of sensor, including, for example, a laser sensor, an automatic sound sensor, (including digital image processing or optical sensor), an optical sensor, a Muon particle sensor, an acoustic sensor, an electromagnetic pulse or frequency modulated sensor, an ultrasound sensor and a yo-yo sensor. Shielding materials and other control components can be selected based on the particular requirements of any given sensor.
[00121] Although illustrated as simple schematic figures, it is understood that any furnace described here can include any suitable features known in the art, including tap blocks, refractory linings, and condition monitoring instruments, screens and control panels. Reactors can also include redundant control mechanisms allowing a human operator to manually activate any of the automated features described above, either directly (by manually controlling an actuator) or indirectly (using a supplementary or override control system).
[00122] With reference to figures 9 and 14m an example of a system for monitoring the level of material contained within a metallurgical furnace includes a plurality of sensors 110 that are communicably connected to a central process controller 138. It is understood that each sensor 110 can also include its own subcontrollers to perform basic calculations and generate sensor output data, including, for example, detected distances 132.
[00123] Process controller 138 is also connected to a suitable power source 190 and can optionally be configured to receive any suitable number of additional or auxiliary input signals 192 from other oven instruments and sensors (including RTD, thermocouples, pressure sensors, and any other type of sensor), and generate and output any number of auxiliary control signals 193 to control other furnace equipment, instruments or processes.
[00124] When used in combination with the examples described above, process controller 138 is configured to output control signals 222 to actuator ports 152, to control power supply, and electrode control signals 218 to electrode actuator 144 to control the movement of electrode 142 and to the power supply regulator to electrode 194 to control electrode energy, and any other suitable oven control actuators.
[00125] Process controller 138 also includes a memory 196 for storing the database of predetermined values for a variety of oven operating parameters against which the measured values can be compared. For example, memory 196 may include a stored range of acceptable or desirable load bank levels 128 for a given furnace 100 (having a known geometry), a maximum fill or overflow limit value, other alarm condition limits ( maximum temperature, minimum temperature, etc.), an acceptable load bank height range 121 and the corresponding overfeed or underfeed alarm limits (optionally alert limits can also be included). A specific setting of the predetermined furnace operating parameters can be provided for each furnace (for example, if the value depends on the furnace geometry) and for each type of product produced or feed material that is introduced into the furnace (each of which must have unique requirements).
[00126] As shown in figure 14, each sensor 110 can include an antenna 230 connected to a transmitter 172 to emit electromagnetic signals 154, and a receiver 174 to receive reflected signals 156. Optionally, sensor 110 can include a subcontroller sensor 210 to process signals 154, 156 to determine the distance between sensor 110 and the object being detected (distance 132 in the examples above). Sensor 110 is configured to produce an output signal from sensor 212 which can include data relating to the distance 132 measured by sensor 110. In the examples where sensor 110 is positioned to measure the location of the upper surface 126 of the load bench 120, the output signal of sensor 212 can be called a level signal or load bank level signal.
[00127] In some examples, sensor 110 is not remotely controllable, and the system can only include a communication link between sensor 110 and process controller 138, for example, to carry the output signal from sensor 212. In other examples, process controller 138 can be configured to control sensor 110 or some other equipment (for example, the hinge or the internal support). In such examples, process controller 138 can be configured to output a control signal from sensor 214 that can be sent to sensor 110.
[00128] In some examples, actuator electrode 144 and electrode power supply regulator 194 described above may be contained within a single electrode control unit 216. In this example, process controller 138 is configured to output an electrode control signal 218 that can be used to control electrode actuator 144, electrode power supply regulator 194 or both. In operation, process controller 138 can also receive information and data from electrode control 216 via electrode output signal 220.
[00129] Similarly, process controller 138 can be connected in a communicable manner to feeder actuator 150 (or any equipment that is used to control the feed rate of material fed into the furnace) so that process controller 138 can send a feed rate control signal 222 and receive a feed rate output signal 224. The feed rate output signal 224 can include any suitable data, including current feed rate and feed port position 150 .
[00130] A display screen control signal 226 can be sent by process controller 138 to display screen 200 and can contain any data or display screen information. Optionally, a display screen output signal 228 can be sent by display screen 200 to process controller 138 to carry information from display screen 200 that includes input equipment to process controller 138 for processing (for example) example, touch screen entries from an operator).
[00131] Optionally, the process controller can be configured to receive one or more one or more auxiliary output signals 192 from a variety of different sensors and furnace equipment. For example, if a given furnace includes a plurality of thermocouples or RTDs to perceive a plurality of temperatures in the furnace, the corresponding process controller 138 can be configured to receive a plurality of temperature output signals 192 and to use the temperature data. received for further processing.
[00132] In addition, to receive auxiliary output signals 192 (output signals 192 are output signals from the various oven instruments and sensors mentioned above and serve as inputs to process controller 138), process controller 138 can be configured to generate any other auxiliary control signal 193 that can be used to provide output data from the process controller, or to control any suitable system or equipment. The nature of auxiliary control signals 193 can be predetermined when process controller 138 is produced and installed, or process controller 138 can be reconfigured by an operator to provide different auxiliary control signals 193 based on the changing operating conditions of the oven.
[00133] Process controller 138 also includes a processor 198 that can be configured using an appropriate method, algorithm or software package to analyze the measured data.
[00134] With reference to figure 11, an example of a method starts at step 1100 with the process controller receiving at least one detected distance from a sensor 110. The detected distance data can be accompanied by a plurality of other information that can be understood and processed by process controller 138, including, for example, location information for the sensor, date and time information, raw data from the outgoing Em signal, and raw data from the reflected EM signal.
[00135] Having received again the distance detected by the sensor, in step 1102 the processor 198, or any other suitable component of the process controller 138, can receive the detected distance 132 and derive the level of the load bank 128 and compare with the range calculated from acceptable levels of load banks 128 for the given reactor 100.
[00136] If the measured distance 132 is equal to an acceptable value, or falls within an acceptable range, the reactor 100 can be left to continue operating without intervention, and the distance can be measured by repeating step 1100 at any time. desired sampling rate (ie, once per second, once per minute, etc.)
[00137] If the derived load bank level 128 is not equal to the desired load bank level 128, processor 198 can determine whether the measured height is greater than the acceptable levels, in step 1104. If the measured distance is greater than an acceptable level, process controller 138 can generate a control signal, for example, an underfeed control signal in step 1106, which is sent to the power supply actuator, for example, port actuator 152, making the door actuator 152 increases the supply of feed material in the oven.
[00138] If the measured distance is less than the acceptable level, process controller 138 can output a control signal in step 1108, for example, a supercharge control signal, which is sent to the power supply actuator , for example, door actuator 152, causing door actuator 152 to decrease the supply of feed material in the oven. The nature and magnitude of the changes appropriate to the rate of supply of feed material can be stored in, or calculated by, a feed rate module 202 and a feed distribution module 204.
[00139] The feed rate module 202 can provide instructions to the processor as to how much of the feed rate should be changed, and the feed distribution module 204 can provide instructions regarding how the feed material should be distributed inside oven 100.
[00140] For example, a process controller 138 connected to multiple sensors 110 can determine that, in a given oven, the level of the load bank in a first portion of the oven is acceptable, the level of the load bank in a second portion of the oven is very high and the level of the load bank in a third portion of the oven is very low. Based on these inputs, process controller 138 can individually control three different port actuators 152, based on instructions from feed rate module 202 and feed distribution module 204, to maintain the current feed rate in the first portion , decrease the feed rate of the feed port it supplies to the second portion and increase the feed rate of the feed port it supplies to the third portion.
[00141] After completing step 1106 or 1108, the method returns to step 1100, which can be conducted at any desired sampling rate, (as described above).
[00142] Alternatively, or in addition to controlling the supply of feed material in oven 100, control signals from process controller 138 can be used to adjust the electrode position or electrode energy.
[00143] With reference to figures 1 to 12, another example of control method 1200 can be a supply control system and can start at step 1202 when process controller 138 obtains a load bank level 128 from sensors 110 and continues at step 1204 in which process controller 138 also receives slag level data 125.
[00144] In step 1206, process controller 138 compares the load bank level 128 with the slag level 125 to obtain the height of the load bank 121 which, in the illustrated examples, is the difference between the two levels 125, 128.
[00145] Having calculated the load bank height 121, process controller 138 can proceed to step 1208, in which the calculated load bank height 121 is compared to one or more predetermined desirable load bank height values , or optionally a range of predetermined desirable values, which are stored in memory, or stored in a remote storage unit and restored by the processor.
[00146] Based on the comparison between the calculated load bank height 121 and the plurality of predetermined desirable heights, in step 1210 the process controller 138 determines whether the calculated load bank height 121 is acceptable, or within a range acceptable.
[00147] If so, process controller 138 does not need to take any immediate action or generate control signals, and method 1200 can return to 1202 to obtain another level of load bank and continue to monitor the process.
[00148] If the height of the load bank 121 is not acceptable or is not within an acceptable range, method 1200 continues in step 1212, in which process controller 138 determines whether the height of the calculated load bank 121 is too large (that is, greater than the desired values stored in memory). If so, method 1200 proceeds to step 1214 in which process controller 138 generates a feed control signal and causes the rate at which feed material is being fed into the oven to be decreased, for example, by controlling the door actuator 152 to close feed ports 150. Once the feed rate has been decreased, method 1200 returns to step 1202 and continues to monitor the oven.
[00149] If process controller 138 determines, in step 1212, that the height of the load bank is below the desirable range, then it can be deduced (or rechecked against the predetermined values) that the height of the load bank 121 is thinner than desired (or below the predetermined desirable range). In that case, in step 1216, process controller 138 can increase the feed rate, thereby increasing the amount of feed material that is fed into the oven. Once the feed rate has been increased, the method returns to step 1202 to continue monitoring.
[00150] With reference to figure 13, another example of control system 1300 can be an emergency stop or an overflow monitoring system that starts at step 1302 when process controller 138 obtains the load bank 128 level from sensors 110.
[00151] In step 1304, the measured load bank level 128 is compared to one or more of the predetermined values of warning and / or alarm and / or shutdown levels that are stored in memory or another suitable location that can be accessed by the processor.
[00152] By comparing the calculated load bank level 128 to the stored level values, process controller 138 can determine whether the load bank level 128 is below a predetermined alarm threshold (step 1306). If not, method 1300 returns to step 1302 and continues to monitor the load bank level.
[00153] If the load bank level 128 is below an alarm threshold value, process controller 138 can generate an alarm output (for example, a siren, a cicada, a flashing light or a warning message) on-screen alert and optionally can output additional control signals to control other operating parameters of the oven including, for example, reducing the feed rate (step 1308). Process controller 138 can be configured to automatically take control of the operating parameters of the furnace, and / or it can encourage the human operator to take corrective action.
[00154] Method 1300 then continues to step 1310 in which the process controller compares the load bank level 128 to a predetermined shutdown level. By comparing the load bank level 128 to the predetermined shutdown level, process controller 138 determines whether the load bank level 128 exceeds a predetermined shutdown threshold (that is, if the distance between the upper surface 126 and the ceiling of the oven 106 is below a safety limit or desired) (step 1312). If not, method 1300 can return to step 1302. If so, the method proceeds to step 1314, where process controller 138 can output an emergency or shutdown control signal that can automatically shut the oven off or transfer control of furnace 100 to human operators.
[00155] In some instances, turning off oven 100 is a complicated multi-step process, and it may be desirable that process controller 138 is not configured to automatically turn off the oven without operator intervention. However, it may still be desirable for process controller 138 to be operated to perform certain operations (either automatically or after the operator receives the information), including, for example, pulling the electrode, stopping the supply of surface material and suggesting closing the metallic residue and / or the slag from the oven.
[00156] In these examples, process controller 138 can operate as a closed loop controller that is able to automatically adjust the operating parameters of the furnace (ie, power supply rate, electrode position, electrode power supply, emergency closing systems) without operator intervention. Such a system allows the process controller 138 to automatically balance energy use and the supply / distribution of power delivered to the oven 100 to allow the oven to operate continuously in a desired stable condition, for example, to continuously maintain the level of the load bank within an acceptable range.
[00157] Process controller 138 can be a standstill unit, which can be connected to an existing oven control system (possibly including a separate oven controller). Alternatively, process controller 138 can be integrated into the furnace control system and can serve as the primary, and optionally unique, controller that is used to control the plurality of reactor operations described above.
[00158] Optionally, process controller 138 can be connected to 200 display screen equipment, which can be used to display a variety of data, including detected or measured distances, power supply rates and load bank levels for a real-time system operator. Looking at display screen 200, the operator can check the operating conditions of a given oven.
[00159] Display screen 200 can be any suitable display screen known in the art, including a computer monitor, a television display screen, a light source, an audible alarm or other audiovisual equipment.
[00160] In addition to the calculation of the load bank levels and the corresponding power supply rates, the process controller can be configured to generate an alarm signal by comparing any of the measured items with the database of the condition conditions. predetermined alarm thresholds stored in memory 196. When the alarm condition is detected (that is, the alarm threshold is reached or exceeded), process controller 138 can generate an alarm output to notify the system operator, and / or automatically initiate an emergency protocol, including, for example, turning off the oven.
[00161] With reference to figure 10, an example of an oven 100 includes a plurality of sensors 110, as described above, and a plurality of thermal sensors, for example, remote temperature diodes (RTD) 206 that are positioned on the side wall of the oven 100 to perceive temperature variations in the material in the oven and to locate the interface planes (surfaces) 176, 178, 126 based on the temperature difference recorded by each RTD. In this example, process controller 138 is connected to each RTD as well as each sensor 110. Process controller 138 can include any additional modules, for example, a temperature measurement module 208, to process data received from RTDs 206 and extrapolate the locations of surfaces 176, 178, 126. This information can be combined with information from the load bank level and used to generate an appropriate control signal that can be used to adjust port actuators 152, the electrode 144, the power supply regulator to electrode 194 and / or any other suitable oven parameter.
[00162] Optionally, in some or all of the examples described here, some or all of the material in the kiln (eg, load bank, slag phase, and / or metal waste phase) can be seeded with detectable material to improve the operation of the sensors. For example, in systems using radar sensors, the material in the kiln can be seeded with particles of highly reflected material on the radar to provide increased reflected signals. Optionally, only certain phases can be seeded, or each phase can be seeded with a different material to increase the sensors' ability to distinguish between layers.
[00163] The present invention has been described here by way of examples only. Various modifications and variations can be made to these exemplary modalities without departing from the spirit and scope of the invention.

权利要求:
Claims (20)
[0001]
1. Method of monitoring a layer of feed material (120) in a metallurgical oven (100), the metallurgical oven being an electric oven and comprising a plurality of layers of material content, characterized by the fact that it comprises: providing at least a non-contact sensor (110) positioned above the feed material layer (120) contained in the oven (100) while the oven is in use, the at least one non-contact sensor (110) comprising at least one transmitter (172) in a fixed position above the feed material layer (120), and in which at least one transmitter (172) is configured to emit an electromagnetic signal in the direction of the plurality of layers, the electromagnetic signal being modulated to produce a predictable partial reflection upon contact with a surface of each of the plurality of layers; provide a protective housing (134) to protect each non-contact sensor (110); thermally shield each sensor by providing a thermal radiation shield between each non-contact sensor (110) and the feed material layer (120); wash each protective housing (134) with cooling gas; measuring a detected distance (132) between an upper surface of the feed material layer (120) and a reference position, using at least one non-contact sensor (110); providing a process controller (138) communicably connected to at least one non-contact sensor (110) to generate a control signal based on the detected distance (132); and generating the control signal, in which the non-contact sensor (110) is electromagnetically isolated from the electromagnetic interference present in the metallurgical furnace (100); wherein the non-contact sensor (110) and characteristics of the electromagnetic signal are selected to penetrate electromagnetic interference; and wherein the protective housing (134) comprises a cassette containing refractory fabric (136) to provide thermal shielding.
[0002]
Method according to claim 1, characterized in that the at least one non-contact sensor (110) additionally comprises providing at least one receiver (174) above the feed material layer (120); and wherein the step of measuring a detected distance (132) comprises collecting a reflection of the electromagnetic signal from the upper surface of the feed material layer (120) using at least one receiver (174) and comparing the electromagnetic signal emitted by at least a transmitter (172) to the reflection collected by at least one receiver (174).
[0003]
Method according to claim 1, characterized in that it further comprises the step of using the process controller (138) to control at least one between the rate of supply of feed material, an electrode position, and a supply electrode power, based on the control signal.
[0004]
4. Method according to claim 2, characterized by the fact that the electromagnetic signal is compared with the reflection and the control signal is produced by the process controller (138) in real time.
[0005]
5. Method according to claim 2, characterized by the fact that it also comprises the supply of a display screen and the generation of a display screen output based on the control signal.
[0006]
Method according to claim 2, characterized in that providing the at least one non-contact sensor (110) comprises providing a plurality of transmitters (172) above the feed material layer (120), and the step measuring the detected distance (132) comprises providing a corresponding plurality of receivers (174) above the feed material layer (120), and determining a detected distance (132) corresponding to each transmitter (172).
[0007]
Method according to claim 6, characterized in that providing the process controller (138) to generate a control signal comprises providing the process controller (138) to generate a plurality of control signals, each signal control based on a detected distance (132).
[0008]
Method according to claim 6, characterized in that providing the process controller (138) to generate the control signal comprises providing the process controller (138) to generate a surface topography based on the plurality of detected distances (132) and a surface control signal based on the surface topography.
[0009]
9. Method according to claim 2, characterized by the fact that it further comprises positioning the at least one non-contact sensor (110) in a second position to measure a second detected distance (132) between a second location on the surface and the reference position.
[0010]
10. Method according to claim 1, characterized in that it provides at least one non-contact sensor (110) to measure a second detected distance (132) between a second layer and the reference position, the second layer being a layer other than the feed material layer (120) between the plurality of layers, and the second detected distance (132) being detected based on the reflection of the electromagnetic signal from the surface of the second layer.
[0011]
11. Method according to claim 1, characterized in that supplying at least one non-contact sensor (110) comprises providing at least one non-contact sensor (110) in a fixed position above the layer of material of (120).
[0012]
Method according to claim 1, characterized in that the metallurgical furnace (100) comprises a plurality of supply ports, and in which the supply of at least one non-contact sensor (110) comprises supplying the at least a non-contact sensor (110) in a position in the vicinity of at least one of the plurality of supply ports.
[0013]
13. Method according to claim 1, characterized in that the metallurgical furnace (100) comprises a plurality of electrode ports, and in which the supply of at least one non-contact sensor (110) comprises providing at least a non-contact sensor (110) in a position in the vicinity of at least one of the plurality of electrode ports.
[0014]
14. Method according to claim 1, characterized in that the provision of at least one non-contact sensor (110) comprises positioning the at least one non-contact sensor (110) above a corresponding opening in a roof of the metallurgical furnace (100), the opening providing an unobstructed line of sight to the feed material layer (120).
[0015]
Method according to claim 8, characterized in that the supply of the process controller (138) to generate a surface control signal based on the surface topography comprises providing the process controller (138) to compare the surface topography with a predetermined surface topography and generate the surface control signal based on the comparison.
[0016]
16. Method according to claim 3, characterized in that using the process controller (138) to control at least one between the feed material supply rate, the electrode position and the electrode energy supply comprises use the process controller (138) to obtain a level of feed material based on the reflection of the electromagnetic signal from the upper surface of the layer of feed material (120), obtain a level of slag based on the reflection of the electromagnetic signal from the surface of a slag layer, compare the level of feed material with the level of slag to determine a height of feed material, compare the height of feed material with a range of predetermined feed material heights and set at least one between the feed material supply rate, electrode position and electrode power supply, based on height comparison feed material and the predetermined feed material height range.
[0017]
17. Method according to claim 3, characterized by the fact that it also comprises the connection through communication of the process controller (138) with a supply actuator (152), and the production of the control signal comprises generating the control signal to automatically regulate the rate of feed material supply based on the control signal.
[0018]
18. Method according to claim 3, characterized by the fact that it also comprises the connection through communication of the process controller (138) with an electrode actuator (144), and the production of the control signal comprises generating the control signal to automatically move an electrode from a first position to a second position based on the control signal.
[0019]
19. Method according to claim 3, characterized by the fact that it also comprises the connection through communication of the process controller (138) with an electrode power supply regulator, and the production of the control signal comprises generating the control signal. control to automatically regulate the power supply to an electrode based on the control signal.
[0020]
20. Method according to claim 3, characterized by the fact that it also comprises selecting the non-contact sensor (110) from a group consisting of a laser sensor, an automatic sound sensor, an optical sensor, an Muon particle, an acoustic sensor, an electromagnetic pulse or frequency modulated sensor, an ultrasound sensor and a yo-yo sensor, and in which characteristics of the electromagnetic signal selected to penetrate the electromagnetic interference are selected from the group consisting of the displacement rate of the electromagnetic signal, frequency of the electromagnetic signal and magnitude of the electromagnetic signal; the protective housing (134) comprises a Faraday cage to provide electromagnetic shielding; the thermal radiation shield includes a removable cassette containing refractory tissue (136); and the thermal radiation shield comprises refractory tissue (136).

类似技术:

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公开号 | 公开日 | 专利标题

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BR112012027312B1|2020-11-17|method of monitoring a layer of feed material in a metallurgical furnace

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同族专利:

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公开号 | 公开日

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EP2564141B1|2016-04-06|

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CA2795652A1|2011-11-03|

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BR112012027312A2|2016-08-02|

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ES2581550T3|2016-09-06|

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EP2564141A1|2013-03-06|

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CN102884388A|2013-01-16|

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CA2795652C|2017-08-22|

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US20110272865A1|2011-11-10|

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US9417322B2|2016-08-16|

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CN102884388B|2016-03-09|

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US9417321B2|2016-08-16|

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ZA201208064B|2014-04-30|

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KR101778329B1|2017-09-26|

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WO2011134052A1|2011-11-03|

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US20110272866A1|2011-11-10|

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EP2564141A4|2014-12-10|

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KR20130060206A|2013-06-07|

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法律状态:
2018-12-26| B06F| Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette]|

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2019-09-10| B06U| Preliminary requirement: requests with searches performed by other patent offices: procedure suspended [chapter 6.21 patent gazette]|

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2020-06-30| B09A| Decision: intention to grant [chapter 9.1 patent gazette]|

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2020-11-17| B16A| Patent or certificate of addition of invention granted|Free format text: PRAZO DE VALIDADE: 20 (VINTE) ANOS CONTADOS A PARTIR DE 26/04/2011, OBSERVADAS AS CONDICOES LEGAIS. |

优先权:

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申请号 | 申请日 | 专利标题

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US32802310P| true| 2010-04-26|2010-04-26|

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US61/328,023|2010-04-26|

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PCT/CA2011/000469|WO2011134052A1|2010-04-26|2011-04-26|Measurement of charge bank level in a metallurgical furnace|

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